Argonne National Laboratory Center for Nanoscale Materials U.S. Department of Energy

2008 CNM Users Meeting

Tuesday, May 6, 2008
4:45-5:45 CNM Facility Tour
7:00-9:30 Users Week Banquet
Wednesday, May 7, 2008

CNM Plenary and Science Session

Bldg. 402 Lecture Hall

8:45-8:50 Welcome, Paul Evans, University of Wisconsin-Madison, CNM UEC Chair
8:50-9:00 Welcome from Laboratory Directorate,Al Sattelberger, Associate Laboratory Director for Energy Sciences & Engineering, Argonne National Laboratory
9:00-9:30 Update from Washington: Eric Rohlfing, Associate Director of Science for Basic Energy Sciences (Acting), U.S. Department of Energy and Director of Division of Chemical Sciences Geosciences and Biosciences Division
9:30-10:00 CNM Update: Stephen Streiffer, Acting Director, CNM
10:00-10:20 Coffee Break
10:20-11:15 Plenary: "Single-molecule studies: From quantum dots to proteins," Rudolph Marcus, California Institute of Technology, and Dmitri Talapin, University of Chicago
11:15-11:45 "Self-Assembly and Conductivity of Nanocrystal Solids," Dmitri Talapin, Chemistry Department, University of Chicago
11:45-12:00 Student Talk: "Thermally Tunable Ferroelectric Thin-Film Photonic Crystals, Pao Tai Lin, Northwestern University
Workshops
4:45-6:30 CNM/EMC Poster Session and Reception
Bldg. 440, 2nd floor gallery
Thursday, May 8, 2008

Workshops

Friday, May 9, 2008

Short Courses

All courses are half-day. They are held in Building 440.

Morning Session: 8:30 a.m. – 12:00 noon

Course A
(maximum of 6 attendees)

Meet in lobby for escort

Confocal Raman Spectroscopy
Instructor: David Gosztola

A hands-on demonstration of the capabilities of the Center's confocal Raman microscope will be presented. Subjects to be discussed and demonstrated include:

  • Basic Raman spectroscopy concepts
  • Anatomy of a confocal Raman microscope
  • Sample preparation
  • Simple spectra collection
  • Effects of excitation wavelength
  • Point mapping
  • Line/area mapping
  • Z-profiling

Attendees are encouraged to bring a sample of interest; please contact the instructor for sample limitations.

Course B
(maximum of 5 attendees)

Room A201

Field Emission Scanning Electron Microscopy
Instructor: JEOL and ThermoFisher Applications Specialists

For high-resolution imaging of nanostructures and surfaces with low or no conductivity, the FESEM is capable of obtaining a resolution of 0.6 nm. It has three backscattered electron detectors, two secondary electron detectors, a transmission electron detector along with an energy filter that works with secondary and backscattered electrons, and a "gentle beam" mode that allows for high-resolution backscattered electron images at <2 kV and greatly improved surface detail at voltages down to 100 V. Elemental analysis is achieved using energy-dispersive spectroscopy (EDS) and wavelength-dispersive spectroscopy (WDS). This course will explain and demonstrate the difference among imaging modes and EDS/WDS applications. The demonstration will be conducted on the JEOL JSM 7500F FESEM equipped with Thermo Fisher EDS and WDS spectrometers.

Course C
(maximum of 8 attendees)

Room A105

Focused Ion Beam Nanofabrication
Instructor: Alexandra Imre

Both for beginner and for experienced focused-ion-beam users, this course will introduce patterning capabilities on our FEI Nova NanoLab Dual Beam instrument. This tool integrates ion and electron beams in one machine, providing quick and accurate navigation and processing. Several gas injection systems are available for ion-beam-induced chemical vapor deposition in addition to the basic ion-beam milling feature. For complex lithography needs, a Raith lithography system is installed that enables GDS file exposure and alignment to existing patterns.

Course D
(maximum of 10 attendees)

Room A106

Nanoimprint Lithography
Instructors: Nanonex vendor and Leo Ocola

High-throughput, large-area replication of patterned nanostructures with sub-10-nm resolution and accurate overlay alignment by step-and-repeat of an imprint master. Some forms of nanoimprinting, such as thermoplastic, ultraviolet-curable, thermal-curable, and direct imprinting (embossing), will be covered. This technique is used to meet the needs of a broad spectrum of markets, such as optical devices, displays, data storage, biotech, semiconductor integrated circuits, chemical synthesis, and advanced materials.

Afternoon Session (1:30 – 5:00 pm)

Course E
(maximum of 8 attendees)

Room A106

Electron-Beam Lithography
Instructors: Leo Ocola and Ming Lu

The Raith 150 30-kV electron lithography system has an easy-to-follow Windows interface; this midsized tool can deliver 12-nm features and also serves as our clean-room SEM. The advanced JEOL9300FS 100-keV electron lithography system reproducibly achieves feature sizes below 10 nm. This state-of-the-art-tool has a 1-nm address grid over a complete 1-mm field size. Pattern placement errors are in the single-digit nanometers. The system can handle samples from small pieces to 8-inch wafers.

Course F
(maximum of 8 attendees)

Room A105

Introduction to Lithography
Instructor: Ralu Divan

Microlithography and nanolithography refer specifically to lithographic patterning methods capable of structuring material on a fine scale. Typically, features smaller than 10 microns are considered microlithographic, while features less than 100 nm are considered nanolithographic. Photolithography generally uses a prefabricated photomask as a master from which the final pattern is derived. The applications of this process are the chemical transfer of two-dimensional patterns in thin films (photoresist) and the microfabrication of three-dimensional forms in substrates by wet and dry chemical etching, among the most common of which is silicon. Photoresists may also be used as templates for other processes (electroplating, patterning material deposited by lift-off).

Course G
(maximum of 10 attendees)

Room A201

Nanocrystalline Diamond Synthesis, Fabrication, and Applications
Instructor: Anirudha Sumant

The Lambda 915-MHz microwave plasma chemical vapor deposition system at CNM is capable of producing diamond films over 200-mm-diameter wafers with unmatched thickness and microstructure uniformity. This course will underline basic differences between micro-, nano-, and ultrananocrystalline diamond thin films and discuss their synthesis process, nucleation and growth mechanisms, and characterization. This course will also discuss integration of diamond films with piezoelectric materials and their applications in fabricating diamond-based MEMS and NEMS.

Course H
(maximum of 8 attendees)

Second-Floor Gallery

Orientation to the Nanoscience Computing Facility
Instructor: Michael Sternberg

Note: You must be registered as a CNM user for computer access:

We will provide an introduction to the CNM high-performance computing cluster, covering capabilities and available applications. We will give an overview on materials modeling and visualization techniques, including hands-on activities for code development and deployment. One component of this course will involve an introduction to the use of periodic, planewave Density Functional Theory codes for rigorous modeling of nanoscale systems. A brief overview of the capabilities of one such code will be given, and we will show how to perform total energy calculations for sample systems such as adsorbates on metal and oxide nanoparticle surfaces. As a second sample application, we will cover the use of two- and three-dimensional finite-difference time-domain programs in nanophotonics. These programs simulate light interacting with a variety of nanostructures that include metallic components.

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